• Specs
    72″ H x 64″ W x 47″ D
    2200 LB
  • Product Overview

    Allwin21 Corp. is a leading supplier of sputter deposition equipment for high technology applications for Semiconductor III-V, II-VI, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industries. The AccuSputter AW 4450 is designed for flexibility offering a wide range of operating and process modes. The highest quality construction, components and Allwin21's new real time AW-4450 System Control assure reliable operation and an ultra clean vacuum environment to yield consistently reproducible results. Every AccuSputter AW 4450 sputtering system is supported by years of technological experience and backed by a worldwide sales and service organization dedicated to prompt courteous service
    AccuSputter AW 4450 Proven Sputter Materials:
    Al+W ,Cr/SiO2, SiC ,Ti+Au,InSnO ,SiO2 ,Ti/W ,Ti+Au+Ni,Al2O3 ,Mo ,SiO2+O2 ,Ni/Fe+Cu+SiO2,Ag MoSi2 ,Si+N2(Si3N4) ,Ti/W+Au,Au ,Mo2Si5 ,Si+N2+B4C, Ti/W+Au+Ta, C, Mo5Si3 ,Ta ,Ti/W+Al/Si,Cr Ni ,TaC, Ti/W+Ni/Cr+Au,Cr/Co ,Ni/Cr, Ta+Au , Ti/W+Pt,Cr/Au, Ni+Ni/Cr, TaSi2 ,Al+Ti/W+Ag, Cr+Cu, Ni/Fe ,Ta+SiO2 , W+Al2O3,Cr/Si ,Pt, Zr ,Zn,Cr/SiO, TiO2 ,TiO2+Cr, ZnO2
    AccuThermo AW 4450 Sputter Key Features:
    Production-proven sputter technology
    Optimum AW-4450 System Control
    DC 24V for Motors, Actuator, Relay, Solenoid
    Efficient 8" Delta cathodes, 2 to 6" option
    Full Pallet rotation control with “indexing”
    High Uniformity and Yield
    DC, RF Sputter, Pulse DC option
    Magnetron and Diode Sputter option
    RF Etch and Bias are optional
    Ultra Clean vacuum system
    Load lock operation
    UHV design
    Flexible for development or production use
    Full range of substrate sizes and shapes
    Various pumping and power options
    Co-sputtering option
    Reactive Sputtering option
    Made in U.S.A.
    AccuSputter AW 4450 Sputter Software Key Features:
    Maintenance, Manual, Semi Automatic and Fully Automatic modes.
    Automated calibration of all subsystems.
    Troubleshooting to subassembly levels.
    Programmed comprehensive calibration and diagnostic functions.
    Recipe creation for full automatic wafer processing.
    Automatic decline of improper recipes and process data inputs.
    Multi-level password protection.
    Storage of multiple recipes and system functions.
    Real-Time process graphics, data acquisition display, and analysis.
    Process Data and Recipe storage automatically to hard drive.
    Easy TC vacuum gauge calibration.
    Positioning Deposition (optional)
    GEM/SECS II (optional)
    AccuSputter AW 4450 Configuration:
    Main Frame
    28" dia. SST chamber top plate with ports for 8-inch(4) circle or Delta (3) Cathodes
    Sputter Power Supply,DC or RF or Pulse DC power, RF: 1-3KW; DC: 5KW or 10KW
    Process Chamber
    8" diameter X 12" high stainless steel cylinder with 6"
    CF flange viewport and load lock port
    28" diameter stainless steel base plate
    11/2" air-operated roughing isolation valve
    Air-operated gas inlet valve
    Air-operated vent valve
    11/2"blanked-off leak check port
    Removable deposition shields
    23" diameter, 3-position water-cooled annular substrate table with variable-speed motorized table drive
    Full circle shutter and vane shutter
    Chain drive pallet carrier transport
    Heavy duty electric hoist
    Load lock
    30" x 28" x 8" stainless steel load lock chamber with aluminum cover
    Chain drive pallet carrier transport
    2" air-operated roughing isolation valve
    Air-operated vent valve
    23" diameter molybdenum annular substrate pallet
    Elevator for pallet up and down function.
    Vacuum Systems for process Chamber
    2 stage Cryo pump with 1000 l/s pumping speed for air, including chevron, water-cooled compressor and lines, automatic regeneration controller and plumbing kit. 71/2" O.D. (6" ASA) aluminum air-operated gate valve Air-operated venetian blind throttling valve.
    36.7 cfm mechanical pump or dry pump for process chamber and load lock (Optional)
    1 gas line with MFC(Ar, 200 SCCM or Customized)
    New Controller: Allwin21 Corp.'s AW-4450 System PC Control
    New Power Distribution Box: AC380V /208V/ 3Phase
    AccuSputter AW 4450 Sputter Options:
    GEM/SECS II function (Software)
    More gas lines with MFC(① N2; ② O2; ③ Customized)
    Lamp tower alarm with buzzer.
    Mechanical pump or dry pump for process chamber and load lock.
    Independent mechanical pump or dry pump for process chamber.
    Chiller for Cooling plates and table.
    Turbo pump for load lock.
    Load lock Lamp Heating function, Up to 200°C
    Chamber Lamp Heating function, Up to 300°C (Use one cathode port in SST chamber top plate).
    Plasma etch function (before sputter)
    Bias function
    Co-sputter function
    Reactive sputter function
    Transformer for AC 380V to 208V for DC Power Supply (if necessary).

    Model Brochure (170 KB)

  • About Company
    Allwin21 Corp

    Allwin21 Corp. was formed in 2000 with a focus on professionally providing Rapid Thermal Process, Plasma Asher Strip / Descum, Plasma Etch/RIE, Sputter Deposition and Metal Film Metrology high-tech semiconductor equipment, services and technical support in Semiconductor III-V, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industries. We endeavor to be a leader in our product lines. We focus on extending product lifecycle, providing solutions, and engineering enhancements to many production proven semiconductor process equipment most directly related to III-V processing. These semiconductor equipment have been used in production and R&D since the 1990′s. They have proven processes and research. Allwin21 Corp. customizes these systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system, and new critical components. This is to achieve the goal of giving our customers a production edge, with right cost, and without having to worry about obsolete parts. Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Process tool. We are manufacturing the new AccuThermo AW Series Rapid Thermal Processors. Compared with traditional RTP systems, Allwin21’s AccuThermo AW RTPs have innovative software and more advanced real time temperature control technologies to achieve the BEST rapid thermal processing performance (repeatability, uniformity, and stability) with decades of research directly applicable to ours. We have maintained a global presence that has grown and expanded into the major high-tech manufacturing areas of the world. We pride ourselves on developing and continuing lasting customer relationships. We understand that a timely responsive support and service are critical elements in semiconductor industries. Allwin21’s experienced engineer team is the best guarantee for high quality service and support. We provide on-site installation, training, maintenance, system optimization, retrofits, and/or customized upgrades What sets us apart from the competition… 1) Exclusive licensed manufacturer of Heatpulse 610 of AG Associates. 2) Advanced Allwin21 Real Time PC Control Technology. 3) Focus on Production-Proven process technology. 4) Integrated 3-axis solid robotic wafer transfer technology. 5) Experienced local engineer support. 6) Products made in U.S.A Main Products: Rapid Thermal Process AccuThermo AW410 AccuThermo AW610 AccuThermo AW810 AccuThermo AW820 AccuThermo AW610V AccuThermo AW820V Sputter Deposition AccuSputter AW4450 Perkin Elmer 4400 Perkin Elmer 4410 Perkin Elmer 4450 Plasma Ash/Descum AW-105R AW-1008 AW-B3000 Plasma Etch/RIE AW-2001R AW-901eR AW-903eR TTW AW-901eR TTW AW-903eR Metal Film Metrology AWgage-150 AWgage-200 Upgrade Kits for : AG Associates Heatpulse 210, Minipulse 310, Heatpulse 410, Heatpulse 610 Rapid Thermal Processing equipment; Tegal 901e, Tegal 903e, Gasonics AE 2001, Matrix 303, Matrix 403, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam AutoEtch 480, Lam AutoEtch 580, Lam AutoEtch 680, Lam AutoEtch 780 Plasma Etcher equipment;Matrix 105, Matrix 106,Matrix 205, Matrix 101,Matrix 102,Matrix 103, Matrix 104, Matrix 10, Gasonics Aura 1000, Gasonics Aura 3000, Gasonics Aura 3010, Gasonics L3510, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000 Plasma Asher ,Plasma Descum Equipment; Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480, Perkin-Elmer 2400 sputter deposition systems Contact Us by