• Specs
    11″ H x 30″ W x 17″ D
    300 LB
  • Product Overview

    The AccuThermo AW610 was derived from the AG Associates 610 production-proven design. Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid Thermal Processing) system. The system uses high intensity visible radiation to heat single wafer for short process periods of time at precisely controlled temperatures. The process periods are typically 1 600 seconds in duration, although periods of up to 9999 seconds can be selected. These capabilities, combined with the heating chamber's cold-wall design and superior heating uniformity, provide significant advantages over conventional furnace processing.
    AccuThermo AW 610 Applications:
    Silicon-dielectric growth
    Implant annealing
    Glass reflow
    Silicides formation and annealing
    Contact alloying
    Nitridation of metals
    Oxygen-donor annihilation
    Other heat treatment process
    AccuThermo AW 610 Typical Application Areas:
    Chip manufacture
    Compound industry: GaAs,GaN,GaP,GaINP,InP,SiC, III-V,II-VI
    Optronics, Planar optical waveguides, Lasers

    AccuThermo AW 610 Key Features:
    35 years’ production-proven Real RTP/RTA/RTO/RTN system.
    Scattered IR light by special gold plated Al chamber surface.
    Allwin21 advanced Software package with real time control technologies and many useful functions.
    Consistent wafer-to-wafer process cycle repeatability.
    Top and bottom High-intensity visible radiation Tungsten halogen lamp heating for fast heating rates with good repeatability performance and long lamp lifetime.
    Cooling N2 (Or CDA) flows around the lamps and quartz isolation tube for fast cooling rates
    Elimination of external contamination by Isolated Quartz Tube
    Up to six gas lines with MFCs and shut-off valves
    Energy efficient.
    Made in U.S.A.
    Small footprint
    AccuThermo AW 610 Software Key Features:
    Integrated process control system
    Real time graphics display
    Real time process data acquisition, display, and analysis
    Programmed comprehensive calibration and diagnostic functions
    Closed-loop temperature control with temperature sensing.
    Precise time-temperature profiles tailored to suit specific process requirements.
    Faster, easier Programmable comprehensive calibration of all subsystems, leading to enhanced process results.
    A recipe editor to create and edit recipes to fully automate the processing of wafers inside the AccuThermo RTP
    Validation of the recipe so improper control sequences will be revealed.
    Storage of multiple recipes, process data and calibration files so that process and calibration results can be maintained and compared over time.
    Passwords provide security for the system, recipe editing, diagnostics, calibration and setup functions.
    Simple and easy to use menu screen which allow a process cycle to be easily defined and executed.
    Troubleshooting feature which allows engineers and service personnel to activate individual subassemblies and functions. More I/O, AD/DA “exposure”.
    Use PowerSum technology to detect the process and increase Yield.
    Watchdog function: If this board looses communication with the control software, it will shut down all processes and halt the system until communication is restored.
    GEM/SECS II function (Optional).
    AccuThermo AW 610 Specifications:
    Wafer sizes: Small pieces, 2", 3", 4", 5", 6" wafer capability
    Recommended ramp up rate: Programmable, 10°C to 120°C per second. Maximum Rate: 200°C (NOT RECOMMENDED)
    Recommended steady state duration: 0-300 seconds per step.
    Ramp down rate: Non-programmable, 10°C to 200°C per second.
    Recommended steady state temperature range: 150°C - 1150°C. Maximum 1250°C (NOT RECOMMENDED)
    ERP Pyrometer 450-1250°C with ±1°C accuracy when calibrated against an instrumented thermocouple wafer.
    Thermocouple 100-800°C with ±0.5°C accuracy & rapid response.
    Temperature repeatability: ±0.5°C or better at 1150°C wafer-to-wafer. (Repetition specifications are based on a 100-wafer set.)
    Temperature uniformity: ±5°C across a 6" (150 mm) wafer at 1150°C. (This is a one sigma deviation 100 angstrom oxide.) For a titanium silicide process, no more than 4% increase in non-uniformity during the first anneal at 650°C to 700°C.
    Process/Purge gas inputs: Any inert and/or non-toxic gas regulated to 30 PSIG and pre-filtered to 1 micron. Typically, N2, O2, Ar, He, forming gas, NH3, N2O2 are used.
    AccuThermo AW 610 Configuration:
    AccuThermo AW 610 Main Frame with wires.
    Power Type: Three Phase, worldwide power (50/60 Hz)
    CE Mark if Necessary
    Pentium® class computer with a 17-inch LCD monitor and Allwin21 Corp proprietary software package.
    Mouse and standard keyboard.
    Aluminum oven chamber with water cooling passages and gold plating plates.
    Door plate with one TC connection port.
    Isolated Quartz Tube W/O Pyrometer window or with Pyrometer Window.
    Oven control board and one main control board.
    Bottom and top heating with 21 (1.2KW ea) Radiation heating lamp module with 4 bank zones (Top Front&Rear, Bottom Front&Rear).
    Quartz Tray for 4 to 6 inch round wafer or customized.
    Gas line with Gas MFC without shut-off valve.
    T-Shape Quartz with qualified K-Type TC and one set holder for 100-800°C temperature measurement.
    Package of 5 pieces of thermocouple wires as spare TC
    USB with original Software backup.

    AccuThermo AW 610 Options:
    Multiple Process Gases (Up to 6) and MFCs with Extended Gas Box and Gas Control Board
    Carrier or Susceptor for small sample, transparent substrate and substrate with metal thin film on top.
    Patented ERP Pyrometer (400-1250°C) as non-contact high temperature sensor.
    Chiller for ERP Pyrometer
    2-inch, 4-inch, 6-inch TC Wafer, Single Point for Pyrometer calibration
    Omega Meter for Pyrometer and Thermocouple calibration
    Shutt-off valve for Quartz Tube & Lamps cooling control
    Spare Parts

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    Model Brochure (188 KB)

  • About Company
    Allwin21 Corp

    Allwin21 Corp. was formed in 2000 with a focus on professionally providing Rapid Thermal Process, Plasma Asher Strip / Descum, Plasma Etch/RIE, Sputter Deposition and Metal Film Metrology high-tech semiconductor equipment, services and technical support in Semiconductor III-V, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industries. We endeavor to be a leader in our product lines. We focus on extending product lifecycle, providing solutions, and engineering enhancements to many production proven semiconductor process equipment most directly related to III-V processing. These semiconductor equipment have been used in production and R&D since the 1990′s. They have proven processes and research. Allwin21 Corp. customizes these systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system, and new critical components. This is to achieve the goal of giving our customers a production edge, with right cost, and without having to worry about obsolete parts. Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Process tool. We are manufacturing the new AccuThermo AW Series Rapid Thermal Processors. Compared with traditional RTP systems, Allwin21’s AccuThermo AW RTPs have innovative software and more advanced real time temperature control technologies to achieve the BEST rapid thermal processing performance (repeatability, uniformity, and stability) with decades of research directly applicable to ours. We have maintained a global presence that has grown and expanded into the major high-tech manufacturing areas of the world. We pride ourselves on developing and continuing lasting customer relationships. We understand that a timely responsive support and service are critical elements in semiconductor industries. Allwin21’s experienced engineer team is the best guarantee for high quality service and support. We provide on-site installation, training, maintenance, system optimization, retrofits, and/or customized upgrades What sets us apart from the competition… 1) Exclusive licensed manufacturer of Heatpulse 610 of AG Associates. 2) Advanced Allwin21 Real Time PC Control Technology. 3) Focus on Production-Proven process technology. 4) Integrated 3-axis solid robotic wafer transfer technology. 5) Experienced local engineer support. 6) Products made in U.S.A Main Products: Rapid Thermal Process AccuThermo AW410 AccuThermo AW610 AccuThermo AW810 AccuThermo AW820 AccuThermo AW610V AccuThermo AW820V Sputter Deposition AccuSputter AW4450 Perkin Elmer 4400 Perkin Elmer 4410 Perkin Elmer 4450 Plasma Ash/Descum AW-105R AW-1008 AW-B3000 Plasma Etch/RIE AW-2001R AW-901eR AW-903eR TTW AW-901eR TTW AW-903eR Metal Film Metrology AWgage-150 AWgage-200 Upgrade Kits for : AG Associates Heatpulse 210, Minipulse 310, Heatpulse 410, Heatpulse 610 Rapid Thermal Processing equipment; Tegal 901e, Tegal 903e, Gasonics AE 2001, Matrix 303, Matrix 403, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam AutoEtch 480, Lam AutoEtch 580, Lam AutoEtch 680, Lam AutoEtch 780 Plasma Etcher equipment;Matrix 105, Matrix 106,Matrix 205, Matrix 101,Matrix 102,Matrix 103, Matrix 104, Matrix 10, Gasonics Aura 1000, Gasonics Aura 3000, Gasonics Aura 3010, Gasonics L3510, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000 Plasma Asher ,Plasma Descum Equipment; Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480, Perkin-Elmer 2400 sputter deposition systems Contact Us by

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