With an installed base of more than thousands of systems, Perkin-Elmer was a leading supplier of sputter deposition equipment for high technology application in 1990's. The Perkin-Elmer 4400 Series, fully refurbished and upgraded by Allwin21 Corp., were designed for flexibility offering a wide range of operating and process modes. The highest quality construction, components and Allwin21's new AW-4450 System Control assure reliable operation and an ultra clean vacuum environment to yield consistently reproducible results. Every fully refurbished and upgraded Perkin Elmer sputtering system was supported by years of technological experience and backed by a worldwide sales and service organization dedicated to prompt courteous service
Perkin-Elmer 4400, 4410, 4450 Proven Sputter Materials:
Al+W ,Cr/SiO2,SiC ,Ti+Au,InSnO ,SiO2 ,Ti/W ,Ti+Au+Ni,Al2O3 ,Mo ,SiO2+O2 ,Ni/Fe+Cu+SiO2,Ag MoSi2 ,Si+N2(Si3N4) ,Ti/W+Au,Au ,Mo2Si5 ,Si+N2+B4C, Ti/W+Au+Ta, C, Mo5Si3 ,Ta ,Ti/W+Al/Si,Cr Ni ,TaC, Ti/W+Ni/Cr+Au,Cr/Co ,Ni/Cr, Ta+Au , Ti/W+Pt,Cr/Au, Ni+Ni/Cr, TaSi2 ,Al+Ti/W+Ag, Cr+Cu, Ni/Fe ,Ta+SiO2 , W+Al2O3,Cr/Si ,Pt, Zr ,Zn,Cr/SiO, TiO2 ,TiO2+Cr, ZnO2
Perkin-Elmer 4400, 4410, 4450 Sputter Key Features:
Production-proven sputter technology
Optimum AW-4450 System Control
DC 24V for Motors, Actuator, Relay, Solenoid
Efficient 8" Delta cathodes, 2 to 6" option
Full Pallet rotation control with “indexing”
High Uniformity and Yield
DC, RF Sputter, Pulse DC option
Magnetron and Diode Sputter option
RF Etch and Bias are optional
Ultra Clean vacuum system
Load lock operation
Flexible for development or production use
Full range of substrate sizes and shapes
Various pumping and power options
Reactive Sputtering option
Made in U.S.A.
Perkin-Elmer 4400, 4410, 4450 Sputter Software Key Features:
Maintenance, Manual, Semi Automatic and Fully Automatic modes.
Automated calibration of all subsystems.
Troubleshooting to subassembly levels.
Programmed comprehensive calibration and diagnostic functions.
Recipe creation for full automatic wafer processing.
Automatic decline of improper recipes and process data inputs.
Multi-level password protection.
Storage of multiple recipes and system functions.
Real-Time process graphics, data acquisition display, and analysis.
Process Data and Recipe storage automatically to hard drive.
Easy TC vacuum gauge calibration.
Positioning Deposition (optional)
GEM/SECS II (optional)
Perkin-Elmer 4400, 4410, 4450 Configuration:
28" dia. SST chamber top plate with ports for 8-inch(4) circle or Delta (3) Cathodes
Sputter Power Supply,DC or RF or Pulse DC power, RF: 1-3KW; DC: 5KW or 10KW
8" diameter X 12" high stainless steel cylinder with 6"
CF flange viewport and load lock port
28" diameter stainless steel base plate
11/2" air-operated roughing isolation valve
Air-operated gas inlet valve
Air-operated vent valve
11/2"blanked-off leak check port
Removable deposition shields
23" diameter, 3-position water-cooled annular substrate table with variable-speed motorized table drive
Full circle shutter and vane shutter
Chain drive pallet carrier transport
Heavy duty electric hoist
30" x 28" x 8" stainless steel load lock chamber with aluminum cover
Chain drive pallet carrier transport
2" air-operated roughing isolation valve
Air-operated vent valve
23" diameter molybdenum annular substrate pallet
Elevator for pallet up and down function.
Vacuum Systems for process Chamber
2 stage Cryo pump with 1000 l/s pumping speed for air, including chevron, water-cooled compressor and lines, automatic regeneration controller and plumbing kit. 71/2" O.D. (6" ASA) aluminum air-operated gate valve Air-operated venetian blind throttling valve.
36.7 cfm mechanical pump or dry pump for process chamber and load lock (Optional)
1 gas line with MFC(Ar, 200 SCCM or Customized)
New Controller: Allwin21 Corp.'s AW-4450 System PC Control
New Power Distribution Box: AC380V /208V/ 3Phase
Perkin-Elmer 4400, 4410, 4450 Sputter Options:
GEM/SECS II function (Software)
More gas lines with MFC(① N2; ② O2; ③ Customized)
Lamp tower alarm with buzzer.
Mechanical pump or dry pump for process chamber and load lock.
Independent mechanical pump or dry pump for process chamber.
Chiller for Cooling plates and table.
Turbo pump for load lock.
Load lock Lamp Heating function, Up to 200°C
Chamber Lamp Heating function, Up to 300°C (Use one cathode port in SST chamber top plate).
Plasma etch function (before sputter)
Reactive sputter function
Transformer for AC 380V to 208V for DC Power Supply (if necessary).
Allwin21 Corp. was formed in 2000 with a focus on professionally providing Rapid Thermal Process, Plasma Asher Strip / Descum, Plasma Etch/RIE, Sputter Deposition and Metal Film Metrology high-tech semiconductor equipment, services and technical support in Semiconductor III-V, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industries. We endeavor to be a leader in our product lines.
We focus on extending product lifecycle, providing solutions, and engineering enhancements to many production proven semiconductor process equipment most directly related to III-V processing. These semiconductor equipment have been used in production and R&D since the 1990′s. They have proven processes and research. Allwin21 Corp. customizes these systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system, and new critical components. This is to achieve the goal of giving our customers a production edge, with right cost, and without having to worry about obsolete parts.
Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Process tool. We are manufacturing the new AccuThermo AW Series Rapid Thermal Processors. Compared with traditional RTP systems, Allwin21’s AccuThermo AW RTPs have innovative software and more advanced real time temperature control technologies to achieve the BEST rapid thermal processing performance (repeatability, uniformity, and stability) with decades of research directly applicable to ours.
We have maintained a global presence that has grown and expanded into the major high-tech manufacturing areas of the world. We pride ourselves on developing and continuing lasting customer relationships.
We understand that a timely responsive support and service are critical elements in semiconductor industries. Allwin21’s experienced engineer team is the best guarantee for high quality service and support. We provide on-site installation, training, maintenance, system optimization, retrofits, and/or customized upgrades
What sets us apart from the competition…
1) Exclusive licensed manufacturer of Heatpulse 610 of AG Associates.
2) Advanced Allwin21 Real Time PC Control Technology.
3) Focus on Production-Proven process technology.
4) Integrated 3-axis solid robotic wafer transfer technology.
5) Experienced local engineer support.
6) Products made in U.S.A
Rapid Thermal Process
Perkin Elmer 4400
Perkin Elmer 4410
Perkin Elmer 4450
Metal Film Metrology
Upgrade Kits for :
AG Associates Heatpulse 210, Minipulse 310, Heatpulse 410, Heatpulse 610 Rapid Thermal Processing equipment; Tegal 901e, Tegal 903e, Gasonics AE 2001, Matrix 303, Matrix 403, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam AutoEtch 480, Lam AutoEtch 580, Lam AutoEtch 680, Lam AutoEtch 780 Plasma Etcher equipment;Matrix 105, Matrix 106,Matrix 205, Matrix 101,Matrix 102,Matrix 103, Matrix 104, Matrix 10, Gasonics Aura 1000, Gasonics Aura 3000, Gasonics Aura 3010, Gasonics L3510, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000 Plasma Asher ,Plasma Descum Equipment; Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480, Perkin-Elmer 2400 sputter deposition systems
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