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ALLWIN21 ACCUSPUTTER AW 4450 SPUTTER DEPOSITION EQUIPMENT

Allwin21 Corp. is a leading supplier of sputter deposition equipment for high technology applications for Semiconductor III-V, II-VI, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industri...

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ALLWIN21 ACCUTHERMO AW 410 RAPID THERMAL PROCESSING EQUIPMENT

The AccuThermo AW410 was derived from the AG Associates 610 production-proven design. Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid...

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ALLWIN21 ACCUTHERMO AW 610

The AccuThermo AW610 was derived from the AG Associates 610 production-proven design. Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid...

3 صور
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ALLWIN21 ACCUTHERMO AW 820 RAPID THERMAL PROCESSING EQUIPMENT

The AccuThermo AW820 was derived from the AG Associates 610 production-proven design. Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid...

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ALLWIN21 AW-1008 PLASMA ASHER EQUIPMENT

The AW-1008 single-wafer photoresist asher is an automated tool designed as a flexible downstream Microwave plasma photoresist removal system for high-volume wafer fabrication. The AW-1008 is in d...

3 صور
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ALLWIN21 AW-105R PLASMA ASHER DESCUM EQUIPMENT

The AW-105R single-wafer photoresist asher and descum is an automated tool designed as a flexible 13.56MHz RF Parallel Plate plasma photoresist removal and descum system for high-volume wafer fabri...

3 صور
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ALLWIN21 AW-2001R MICROWAVE PLASMA ETCHER EQUIPMENT

The AW-2001R single-wafer Etcher is an automated tool designed as a flexible downstream Microwave system for high-volume wafer fabrication. AW-2001R is in direct response to manufacturer’s concerns...

2 صور
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ALLWIN21 AW-901ER PLASMA ETCHER EQUIPMENT

The AW-901eR & AW-903eR single-wafer dry etchers are automated tools designed as a flexible 13.56MHz RF Parallel Plate plasma etching systems for high-volume wafer fabrication. AW-901eR & AW-903eR ...

2 صور
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ALLWIN21 AW-903ER PLASMA ETCHER / RIE EQUIPMENT

The AW-901eR & AW-903eR single-wafer dry etchers are automated tools designed as a flexible 13.56MHz RF Parallel Plate plasma etching systems for high-volume wafer fabrication. AW-901eR & AW-903eR ...

2 صور
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ALLWIN21 AW-B3000 BARREL PLASMA ASHER PLASMA DESCUM EQUIPMENT

The AW-B3000 batch/barrel photoresist asher is a manual load tool designed as a flexible 13.56 MHz RF plasma photoresist removal system for high-volume wafer fabrication. The AW-B3000 is in direct ...

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ALLWIN21 AWGAGE-150 METAL FILM METROLOGY

AWgage-150 measures sheet resistance in ohms per square or milliohms per square. If specific resistivity is known, the thickness of the deposited film layer can be computed from the sheet resistanc...

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ALLWIN21 AWGAGE-200 METAL FILM METROLOGY

AWgage-200 measures sheet resistance in ohms per square or milliohms per square. If specific resistivity is known, the thickness of the deposited film layer can be computed from the sheet resistanc...

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ALLWIN21 PERKIN-ELMER 4400 SPUTTER DEPOSITION EQUIPMENT

With an installed base of more than thousands of systems, Perkin-Elmer was a leading supplier of sputter deposition equipment for high technology application in 1990's. The Perkin-Elmer 4400 Series...

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